Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy
The Scanning Electron Microscopes at Danchip
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
The SEM that will cover most users needs is the Leo SEM. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system. You can obtain excellent images on a large variety of materials such as semiconductors, semiconductor oxides or nitrides, metals, thin films and some polymers.
The popularity and need for the Leo SEM is however such that a 'maximum 2 hour per session' policy is necessary - so it may be difficult to get access to it. The less advanced Jeol SEM offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the Jeol SEM is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than the Leo SEM. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job. To use it, a 1-2 hour training session is necessary.
The new FEI SEM is our most advanced SEM.