Specific Process Knowledge/Etch/ICP Metal Etcher/silicon
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Revision as of 14:12, 11 December 2012 by Jml (talk | contribs) (→Silicon etching on the ICP Metal Etcher)
Silicon etching on the ICP Metal Etcher
In the primary silicon etcher at Danchip, the DRIE-Pegasus, silicon is etched using a fluorine based plasma (with SF6 as etch gas). Silicon is also etched by chlorine and bromine.