Specific Process Knowledge/Characterization/Four-Point Probe

From LabAdviser

Four-Point Probe

The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose is to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.

The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.

Four point probe: positioned in cleanroom 4

The user manual, technical information and contact information can be found in LabManager:

Four point probe

Overview of the performance of the Four-Point Probe and some process related parameters

Purpose Resistance and resistivity measurement
Process parameter range Process Temperature
  • room temperature
Process pressure
  • 1 atm
Substrates Batch size
  • 1 4" wafer per measurement
Substrate material allowed
  • Silicon wafers
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Four-Point_Probe&oldid=7672"