Specific Process Knowledge/Characterization/Four-Point Probe

Four-Point Probe

The Four-Point Probe is a Veeco FPP-5000 for I/V measurement. The main purpose it to measure resistance and resistivity on a 4" silicon wafer. But can also be used to find thickness of thin layers or test if is a N- or P-type wafer.

The wafer are pushed down on the four pins so a measurement is performed. It works only for 4" wafers because a special holder is need.

Four point probe: positioned in cleanroom 4

The user manual,technical information and contact information can be found in LabManager:

Four point probe

Overview of the performance of the boron pre-dep furnace and some process related parameters

Purpose	Doping of boron
Performance		Look at the process knowlege
Process parameter range	Process Temperature	900-1150 oC
	Process pressure	1 atm
	Gasses on the system	Ar, N2
Substrates	Batch size	1-30 4" wafer (or 2" wafers) per run
	Substrate material allowed	Silicon wafers (new from the box or RCA cleaned) In doubt: look at the cross contamination chart or send a mail to the Furnace group.