Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec
Silicon sputter
Silicon can be deposited in Wordentec.
Parameters
Listed below are tried parameters, that can be used during deposition. Use the rates as a start value, and make a test to be sure that you get the right thickness.
Please don´t use higher power then 180W, since the target then could breake into a lot of small pieces.
Settings 1 | Settings 2 | |
---|---|---|
Process type | Sputtering | Sputtering |
Power | 130W | 170W |
Sputter pressure | 5*10-3 | 1*10-2 |
Rate | About 0,7Å/s | About 0,6Å/s |