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Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec

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Silicon sputter

Silicon can be deposited in Wordentec.

Parameters

Listed below are tried parameters, that can be used during deposition.

Please don´t use higher power then 180W, since the target then could breake into a lot of small pieces.

	Setting
Process type	Sputtering
Power	130W
Sputter pressure	5*10^-2
Rate	About 0,6Å/s

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