Specific Process Knowledge/Polymer Processing/Polymer Processing/Additive methods/Quantum X 2PP

The Nanoscribe Quantum X align in PolyFabLab.

Introduction

The Nanoscribe Quantum X align is a 3D printer based on two-photon polymerization (2PP) and designed for rapid microfabrication of polymer structures. It features a femtosecond pulsed diode laser operating at 780 nm outputting a laser power of 250 mW. In addition, it is equipped with a sample stage with a 50 × 50 × 20 mm travel range that can fit up to an 8-inch wafer, a confocal module for aligning prints to features on a substrate, a photoresist dispenser, and fiber illumination ports to facilitate the alignment of prints onto optical fibers.

Job files are prepared using either DeScribeX or NanoPrintX. DeScribeX is used for large prints that exceed the print field of the microscope objective, while NanoPrintX is used for prints that need to be aligned to features on a substrate.

Print chamber of the Quantum X align with a 25× microscope objective and sample holder mounted.

Microscope objectives

Microscope objectives available for the Quantum X align along with select specifications.

Photoresists

Photoresists available to use free of charge are IP-Dip2 (for the 63× objective), IP-S (for the 25× objective), and IPX-Q (for the 10× and 5× objectives).

Substrates

Substrates available to use free of charge are microscope slides (76 × 26 × 1 mm, silanized or unsilanized) and silicon chips (25 × 25 × 0.725 mm). Silicon wafers (from 1-inch up to 8-inch) can be used. For printing on chips and other small substrates, they can be placed on an adhesive gel-pak. It is also possible to use optical fibers as substrates.