Specific Process Knowledge/Thin film deposition/Deposition of Carbon

From LabAdviser
< Specific Process Knowledge‎ | Thin film deposition
Revision as of 19:45, 20 December 2022 by Eves (talk | contribs) (→‎Deposition of Carbon)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Feedback to this page: click here

Deposition of Carbon

Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker):

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Carbon&oldid=42065"