Specific Process Knowledge/Cleanroom Chemicals

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This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate.

Acids, bases, and etchants

  • Ammonia solution 28%
  • Ammonium persulphate (Powder)
  • BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
  • BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
  • BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
  • Boric acid
  • Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
  • HF 5%
  • HF 40%
  • Hydrochloric acid 37%
  • Hydrogen peroxide 31%
  • Nitric acid 69%
  • Phosphoric acid 85%
  • Potassium hydroxide (Pellets)
  • Potassium hydroxide 50%
  • Sulfamic acid
  • Sulfuric acid 96%

Developers

  • AR 600-546 (Amyl acetate)
  • AZ 351B (NaOH based with disodium tetraborate buffer)
  • AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting)
  • mr-Dev 600 (PGMEA)
  • ZED-N50 (n-Amylacetate)

Resists

  • AR-P 6200.09
  • AZ 4562
  • AZ 5214E
  • AZ MiR 701 (29cps)
  • DUV42S-6 (BARC for stepper)
  • KRF M230Y 6cp
  • KRF M35G 27cp
  • SU-8 2005
  • SU-8 2035
  • SU-8 2075

Solvents

  • 2-Propanol "IPA"
  • Acetone
  • Anisole
  • AR 600-71 (Mixture of Dioxolane, PGME)
  • A-Thinner (Anisole)
  • Ethanol
  • MIBK
  • PGMEA (available as mr-Dev 600)
  • Remover 1165 (NMP)

Other chemicals

  • HMDS