Optical endpoint detection on the dry etch tools at DTU Nanolab

Several dry etch tools at DTU Nanolab are equipped with an endpoint detection system. Out of those systems only one is not of the type optical endpoint detection. The instruments are:

ICP Metal Etch
III-V ICP
Pegasus 1
Pegasus 4

The section below describes

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Monitored species	Wavelength (nm)	Monitored species	Wavelength (nm)
Al	308.2, 309.3, 396.1	In	325.6
AlCl	261.4	N	674.0
As	235.0	N2	315.9, 337.1
C2	516.5	NO	247.9, 288.5, 289.3, 303.5, 304.3, 319.8, 320.7, 337.7, 338.6
CF2	251.9	O	777.2, 844.7
Cl	741.4	OH	281.1, 306.4, 308.9
CN	289.8, 304.2, 387.0	S	469.5
CO	292.5, 302.8, 313.8, 325.3, 482.5, 483.5, 519.8	Si	288.2
F	703.7, 712.8	SiCl	287.1
Ga	417.2	SiF	440.1, 777.0
H	486.1, 656.5