Specific Process Knowledge/Thin film deposition/Deposition of Titanium Nitride
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Deposition of Titanium nitride
Thin films of titanium nitride can only be deposited in the ALD2 at the moment. More information about the process can be found here.
Comparison between sputtering and ALD methods for deposition of Titanium nitride.
ALD2 | Sputter System Lesker | |
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Generel description |
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Stoichiometry |
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Film Thickness |
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Deposition rate |
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Step coverage |
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Process Temperature |
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Substrate size |
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Allowed materials |
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