Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI

From LabAdviser

< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | showerheadchange

Revision as of 10:19, 9 August 2022 by Jmli (talk | contribs)

(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
15/12-2014	4" Wafer with travka65 mask	AZ standard	Si / 65 %	Pegasus/jmli	10 minute TDESC clean	nanolab/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins	S004745	New showerhead

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI&oldid=40990"