Specific Process Knowledge/Thin film deposition/Deposition of Platinum

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Platinum deposition

Platinum can be deposited by e-beam evaporation or sputtering. In the chart below you can compare the different deposition equipment.

	E-beam evaporation (Temescal)	E-beam evaporation (Wordentec)	E-beam evaporation (Physimeca)	Sputter deposition (Lesker)
General description	E-beam deposition of Pt	E-beam deposition of Pt	E-beam deposition of Pt	Sputter deposition of Pt
Pre-clean	Ar ion source	RF Ar clean		RF Ar clean
Layer thickness	10Å - 1µm*	10Å to 5000Å*	10Å to 2000Å	10Å to 5000Å
Deposition rate	0.5Å/s to 10Å/s	10Å/s to 15Å/s	10Å/s	? Å/s to ? Å/s
Batch size	Up to 4x6" wafers Up to 3x8" wafers (ask for holder) smaller wafers and pieces	24x2" wafers or 6x4" wafers or 6x6" wafers	1x 2" wafer or 1x 4" wafers or Several smaller pieces	1x4" wafer or 1x6" wafer smaller pieces
Allowed materials	Silicon oxide Silicon (oxy)nitride Photoresist PMMA Mylar Metals See also the cross-contamination sheet	Silicon Silicon oxide Silicon (oxy)nitride Photoresist PMMA Mylar SU-8 Metals	III-V materials Silicon wafers Quartz wafers Pyrex wafers	Silicon Silicon oxide Silicon nitride Silicon (oxy)nitride Photoresist PMMA Mylar SU-8 Metals Carbon
Comment	As of August 2018, Pt has not yet been deposited in the Temescal. Please contact the Thin Film group to develop a process.

* If depositing a total of more than 600 nm, please write to metal@danchip.dtu.dk well in advance to ensure that enough material is present.