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Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers

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< Specific Process Knowledge‎ | Thin film deposition‎ | ALD Picosun R200

Revision as of 15:19, 19 May 2016 by Eves (talk | contribs) (→‎Al2O3/TiO2 multilayers on high aspect ratio structures)

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This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al₂O₃

Recipe: Al2O3LT

Temperature:80-150 ^oC

Low temperature deposition of TiO₂

Recipe: TiO2LT

Temperature: 80-150 ^oC

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120 ^oC

Al₂O₃/TiO₂ multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 150 ^oC

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