Jump to content

Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers

From LabAdviser

< Specific Process Knowledge‎ | Thin film deposition‎ | ALD Picosun R200

Revision as of 14:18, 19 May 2016 by Eves (talk | contribs) (→‎Al2O3/TiO2 multilayers on high aspect ratio structures)

(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

This page describes non standart recipes including multilayers structures.

Low temperature deposition of Al₂O₃

Recipe: Al2O3LT

Temperature:80-150C

Low temperature deposition of TiO₂

Recipe: TiO2LT

Temperature: 80-150C

Low temperature grown multilayers on flat surfaces

Recipe: EMA01

Recipe: EMA02

Recipe: EMA03

Recipe: EMA04

Temperature: 120C

Al₂O₃/TiO₂ multilayers on high aspect ratio structures

Recipe: Multi T

Temperature: 150C

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ALD_multilayers&oldid=23388"