Specific Process Knowledge/Wafer cleaning/RCA

The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). It consist of two solutions: RCA1 and RCA2

The RCA1 contains H$_{2}$O, NH$_{4}$OH and H$_{2}$O$_{2}$ (5:1:1). It is used for removed of light organics, particles and metal.

The RCA2 contains H$_{2}$0, HCl and H$_{2}$O$_{2}$ (5:1:1). It is used for removal of heavy metals, alkalies and metal hydroxides.