Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE blazed gratings

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  • 30min etch with 100nm Cr mask
    30min etch with 100nm Cr mask
  • 45min etch with 100nm Cr mask
    45min etch with 100nm Cr mask
  • 20min etch with Krf resist, all resist is gone
    20min etch with Krf resist, all resist is gone
  • 15+30min etch with 50nm Cr mask
    15+30min etch with 50nm Cr mask
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