Specific Process Knowledge/Wafer cleaning

Feedback to this page: click here

Clean with:

• RCA - Two step process to remove organics and metals
• 7-up & Piranha - Removes organics and alkali ions
• 5% HF - Removing native oxide
• IMEC - Cleaning before fusion bonding
• Soap Sonic - Cleaning of "dirty" wafers when entering the cleanroom