Specific Process Knowledge/Etch/Etching of Titanium
Etching of Titanium
Etching of Titanium is done wet at Danchip making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4 or in the PP-etch bath in the fume hood in cleanroom 2. We have ?:
- BHF
- Cold RCA1 (as stripper)
Comparing the two solutions
| BHF | Cold RCA1 | |
|---|---|---|
| General description |
Etch of titanium with or without photoresist mask. |
Etch of titanium (as stripper) |
| Chemical solution | HF:NHF | NH3OH:H2O2:H2O - 1:1:5 |
| Process temperature | Room temperature | Room temperature |
| Possible masking materials |
Photoresist (1.5 µm AZ5214E) |
None |
| Etch rate |
Not known (it bubbles while etching) |
Not known |
| Batch size |
1-25 wafers at a time |
1-25 wafer at a time |
| Size of substrate |
4" wafers |
4" wafers |
| Allowed materials |
No restrictions when used in beaker or PP-etch bath in the fume hood in cleanroom 2. |
|
