Specific Process Knowledge/Characterization/Sample imaging

The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications.

There is a lot of optical microscope scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to

inspect the quality of UV exposed photoresist when doing photolithography,
check for particles on wafers that have been processed in the furnaces or the PECVD's,
check the quality of KOH etched structures or
generally verify any in batch process

Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need.

	Optical microscopes	SEM	AFM
Magnification range	25x to 1000x	100x to 500.000x	Maximum scanned area 90x90 µm
Depth of focus	Low	Very high