Specific Process Knowledge/Etch/Etching of Titanium
Etching of Titanium
Etching of Titatium is done wet at Danchip making your own set up in a beaker in a fumehood - preferably in cleanroom 2 or 4 or in the PP-etch bath in the fumehood in cleanroom 2. We have ?:
- BHF
Comparing the two solutions
| BHF | ||
|---|---|---|
| General description |
Etch of titanium with or without photoresist mask. |
Etch of |
| Chemical solution | HF:NHFailed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle _4} F | . |
| Process temperature | Room temperature | |
| Possible masking materials: |
Photoresist (1.5 µm AZ5214E) |
. |
| Etch rate |
? |
? |
| Batch size |
1-25 wafers at a time |
1-25 wafer at a time |
| Size of substrate |
4" wafers |
4" wafers |
| Allowed materials |
No restrictions when used in beaker or PP-etch bath in the fumehood in cleanroom 2. |
|