Deletion log
Below is a list of the most recent deletions.
- 15:12, 22 April 2014 Bghe talk contribs deleted page Roughness, grain size and uniformity of TiW layers (content was: "For the sputter process, the effect and argon pressure can be set to different values. Depending on the process parameters, the deposited layers will have different charact..." (and the only contributor was "Kn"))
- 15:11, 22 April 2014 Bghe talk contribs deleted page Process SPecific Knowledge/Photolithography/AZ5214E diluted positive resist (content was: "==Pretreatment== {{testtemplate}} ==Spinning== ==Baking== ==Exposure== ==Developing==")
- 15:11, 22 April 2014 Bghe talk contribs deleted page Process Flow (content before blanking was: "*alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly *proces to check you bottomaligning *alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly # HMDS # PR1_5 bagside...")
- 15:11, 22 April 2014 Bghe talk contribs deleted page Polishing machine (content was: "Details will come by the end of 2012. See LabManager for now. /Jesper Hanberg" (and the only contributor was "Jehan"))
- 15:10, 22 April 2014 Bghe talk contribs deleted page Packaging (content was: "== Choose an equipment == *Wire bonder(s) *Anodic bonder (EVG 520 Hot Embosser) *Wafer scriber *Saw *Polishing machine")
- 15:09, 22 April 2014 Bghe talk contribs deleted page Old equipment for decommissioning (content was: " {| border="2" cellspacing="2" cellpadding="3" | align="center" style="background:#f0f0f0;"|''' Equipment''' | align="center" style="background:#f0f0f0;"|''' Supplier ''' | align="center" style="background:#f0f0f0;"|''' Expected out of ...")
- 15:09, 22 April 2014 Bghe talk contribs deleted page New equipment in the pipeline/Ion Beam Etch and Deposition Tool (content was: "==Oxford Ionfab300plus: Ion Beam Etch and Deposition Tool== We have ordered an [http://www.oxford-instruments.com/products/etching-deposition-growth/tools/tools/ionfab-3..." (and the only contributor was "BGE"))
- 15:08, 22 April 2014 Bghe talk contribs deleted page New equipment in the pipeline (content was: "Here is presented an overview of the various pieces of equipment in the pipeline for the DTU Danchip facility. <br> {| border="2" cellspacing="2" cellpadding="3" | align="center" style="background:#f0f0f0;"|''' Equipment''' | align="ce...")
- 15:07, 22 April 2014 Bghe talk contribs deleted page Material to be etched (content was: "== Choose material to be etched == *Aluminium *Chromium *Gold *Polymer *Silicon *Silicon nitride *Silicon oxide *Titanium" (and the only contributor was "BGE"))
- 15:06, 22 April 2014 Bghe talk contribs deleted page Main Page/Specific Process Knowledge/Process flow approval (content was: "== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ..." (and the only contributor was "Tg"))
- 15:05, 22 April 2014 Bghe talk contribs deleted page LabAdviser/LabAdviser Updates (content was: "Each month a list of resent updates in LabAdviser is created and send to the cleanroom users. This is to give the users an update on the pages that are edited an easy-to..." (and the only contributor was "BGE"))
- 15:04, 22 April 2014 Bghe talk contribs deleted page LabAdviser/Introduction to LabAdviser and Processing/LabAdviser Structure (content was: "image:LabAdviser structure.jpg|1000px|This image gives an idea of the page tree structure in LabAdviser and also an idea of the thoughts behind the structure. The quest..." (and the only contributor was "BGE"))
- 15:02, 22 April 2014 Bghe talk contribs deleted page How to ad information to LabAdvisor (content was: "===Purpose of the LabAdvisor - sharing of knowledge=== The purpose of LabAdvisor is sharing of knowledge. In our laboratory thousands of experiments have been made and we..." (and the only contributor was "BGE"))
- 15:01, 22 April 2014 Bghe talk contribs deleted page Hardware Information (Supplied by STS) (content was: "Image:Example.jpg" (and the only contributor was "Roycork"))
- 15:01, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/HiVac/bgeAlPoly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
- 14:59, 22 April 2014 Bghe talk contribs deleted page Etching of Silicon Nitride (content was: "Silicon nitride can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (b..." (and the only contributor was "192.38.87.76"))
- 14:58, 22 April 2014 Bghe talk contribs deleted page Bge al poly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
- 14:57, 22 April 2014 Bghe talk contribs deleted page Etch/Etching of Aluminium (content was: "Etching of Aluminium can be done using our wet." (and the only contributor was "192.38.87.76"))
- 14:57, 22 April 2014 Bghe talk contribs deleted page Etch (content was: "== Choose material to be etched == *Aluminium *Chromium *Titanium *Gold *Platin *Polymer *Etchi...")
- 14:49, 22 April 2014 Bghe talk contribs deleted page ALD Picosun R200 (content was: " =ALD Picosun 200= '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/ALD..." (and the only contributor was "Pevo"))
- 14:46, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/III V thermal processes/Jipelec RTP (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/III-V_Process/III_V_thermal_processes/Jipelec_RTP click her...")
- 14:45, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Bulk Glass/Deep Wet Etch in Glass (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledg..." (and the only contributor was "BGE"))
- 11:22, 5 September 2013 Jehan talk contribs undeleted page File:Laser Micromachining Tool stage room details.jpg (2 revisions and 1 file restored)
- 11:21, 5 September 2013 Jehan talk contribs deleted page File:Laser Micromachining Tool stage room details.jpg (Duplicated file)
- 09:41, 14 May 2013 Jehan talk contribs deleted page File:4524 ball wire-bonder.jpg (Duplicated file)
- 15:23, 8 May 2013 Jehan talk contribs deleted page File:K&S 4524 ball wire-bonder.jpg (Deleted old revision 20130508142134!K&S_4524_ball_wire-bonder.jpg)
- 15:23, 8 May 2013 Jehan talk contribs deleted page File:K&S 4524 ball wire-bonder.jpg (Deleted old revision 20130508142108!K&S_4524_ball_wire-bonder.jpg)
- 08:21, 15 April 2013 Jehan talk contribs deleted page File:Green Belt Jan 2013 Process.pdf (Deleted old revision 20130415071900!Green_Belt_Jan_2013_Process.pdf: Duplicated file)
- 08:21, 15 April 2013 Jehan talk contribs deleted page File:Green Belt Jan 2013 Process.pdf (Deleted old revision 20130415071332!Green_Belt_Jan_2013_Process.pdf: Duplicated file)
- 08:20, 15 April 2013 Jehan talk contribs deleted page File:Green Belt Jan 2013 Process.pdf (Deleted old revision 20130415070720!Green_Belt_Jan_2013_Process.pdf: Duplicated file)
- 08:20, 15 April 2013 Jehan talk contribs deleted page File:Green Belt Jan 2013 Process.pdf (Deleted old revision 20130221114423!Green_Belt_Jan_2013_Process.pdf: Duplicated file)
- 08:10, 15 April 2013 Jehan talk contribs deleted page File:Green Belt Jan 2013 Process.pdf (Deleted old revision 20130415070942!Green_Belt_Jan_2013_Process.pdf: Duplicated file)
- 08:24, 26 February 2013 Pvl talk contribs deleted page File:7 4 Reversed bake.jpg (Deleted old revision 20130226072406!7_4_Reversed_bake.jpg: Duplicated file)
- 14:02, 6 February 2013 BGE talk contribs deleted page File:Optical Profiler Table 2.jpg (Deleted old revision 20130206130001!Optical_Profiler_Table_2.jpg: I have uploaded a newer version)
- 13:18, 23 January 2013 BGE talk contribs deleted page File:RIE OHPOLYA TRAVKA 10 200um00.jpg
- 15:52, 12 December 2012 Pvl talk contribs deleted page File:Nikon SMZ 1000.jpg (Deleted old revision 20121212144827!Nikon_SMZ_1000.jpg: Duplicated file)
- 15:52, 12 December 2012 Pvl talk contribs deleted page File:Nikon SMZ 1000.jpg (Deleted old revision 20121203104714!Nikon_SMZ_1000.jpg: Duplicated file)
- 14:21, 18 September 2012 BGE talk contribs deleted page Specific etch epuipment (content was: '== Choose a dry etch epuipment == *RIE (Reactive Ion Etch) *ASE (Advanced Silicon Etch) *AOE (Advanced Oxide Etch)' (and the only contributor was 'BGE'))
- 14:19, 18 September 2012 BGE talk contribs deleted page Etching of Chromium (content was: 'Etching of Chromium can be done with our wet etch' (and the only contributor was '192.38.87.76'))
- 14:14, 2 February 2012 Meno talk contribs deleted page User:Js (content was: 'Jonas Skou mailto:"skou.jonas@gmail.com"' (and the only contributor was 'Ast'))
- 14:50, 1 July 2011 Jehan talk contribs deleted page Specific Process Knowledge/Photolithography/Making Mask design/template:mask spec.txt (content was: ' <nowiki> Lyngby 20.6.11 All Layers: 5" chromium mask Soda-lime Glass Dark periphery Chromium up CIF-file: MyMask.cif Layer: MT1 Mask Type: Clear field, wro...' (and the only contributor was 'Jehan'))
- 09:17, 18 November 2010 Tg talk contribs deleted page Process flow approval (content was: '== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ...' (and the only contributor was 'Tg'))
- 14:35, 25 October 2010 Tg talk contribs deleted page III V wet etches (content was: '==HCl:H3PO4 etch== HCl(37%):H<math>_3</math>PO<math>_4</math>(85%) is a selective, anisotropic and slow etching of InP. Very slow rate in quarternaries. The etch rates dep...' (and the only contributor was 'Tg'))
- 12:54, 22 October 2010 Tg talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/CHF3 O2 RIE (content was: '== CHF<math>_3</math> / O<math>_2</math> etch== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</m...' (and the only contributor was 'Tg'))
- 13:34, 18 September 2009 Jml talk contribs deleted page \mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
- 13:33, 18 September 2009 Jml talk contribs deleted page Specific Process Knowledge/III-V Process/photolithography/mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
- 08:32, 1 September 2008 Jml talk contribs deleted page Characterization/SEM: Scanning Electron Microscopy/Jeol (content was: 'tyk' (and the only contributor was 'Jml'))
- 16:26, 23 November 2007 WikiSysop talk contribs deleted page File:Test.cif
- 13:18, 11 October 2007 WikiSysop talk contribs deleted page File:Dell690.pdf
- 11:16, 11 October 2007 WikiSysop talk contribs deleted page File:Portrait.jpg