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- 15:32, 1 July 2011 Jehan talk contribs uploaded a new version of File:Mask spec.doc
- 15:30, 1 July 2011 Jehan talk contribs uploaded File:Mask spec.doc
- 13:45, 24 June 2011 Jml talk contribs uploaded File:DRIE-Pegasus.jpg (The SPTS DRIE-Pegasus )
- 12:33, 23 June 2011 Jml talk contribs uploaded File:Boostdelay4b.jpg (The splitting on the etch cycle on the Pegasus into three parts: Boost, Delay and Main)
- 09:41, 22 June 2011 Ast talk contribs changed group membership for Helsc from (none) to nanotech
- 13:34, 16 June 2011 Ast talk contribs changed group membership for Ehn from (none) to nanotech
- 14:36, 15 June 2011 Ast talk contribs changed group membership for Ywlu from (none) to dtu
- 08:56, 15 June 2011 Ast talk contribs changed group membership for Alea from (none) to nanotech
- 11:51, 8 June 2011 Ast talk contribs changed group membership for Mfc from (none) to nanotech
- 11:49, 8 June 2011 Ast talk contribs changed group membership for Cag from (none) to nanotech
- 14:48, 7 June 2011 Ast talk contribs changed group membership for Eag from (none) to nanotech
- 13:13, 7 June 2011 Ast talk contribs changed group membership for Afa from (none) to nanotech
- 13:10, 7 June 2011 Ast talk contribs changed group membership for Keem from (none) to fotonik
- 08:49, 7 June 2011 Jehan talk contribs uploaded File:Process flow template (rename to .dotx).docx
- 10:15, 1 June 2011 Ast talk contribs changed group membership for Jmp from (none) to industry
- 12:57, 31 May 2011 Ast talk contribs changed group membership for Axla from (none) to industry
- 11:39, 31 May 2011 Ast talk contribs changed group membership for Mamat from (none) to nanotech
- 12:25, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-150.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-120.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-090.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-060.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-030.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:30, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:30, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:28, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:28, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:44, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:44, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 12:42, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 12:42, 29 April 2011 Jml talk contribs uploaded a new version of File:WF 2E07a mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 12:40, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
- 14:33, 28 April 2011 Ast talk contribs changed group membership for As from (none) to industry
- 08:44, 28 April 2011 BGE talk contribs changed group membership for Jehan from danchip to danchip, administrator and bureaucrat