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• 08:52, 16 March 2011 Jml talk contribs uploaded File:WF 2B1 feb06 2011-120.jpg (The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.)
• 08:52, 16 March 2011 Jml talk contribs uploaded File:WF 2B1 feb06 2011-090.jpg (The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.)
• 08:52, 16 March 2011 Jml talk contribs uploaded File:WF 2B1 feb06 2011-060.jpg (The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.)
• 08:52, 16 March 2011 Jml talk contribs uploaded File:WF 2B1 feb06 2011-030.jpg (The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.)
• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-150nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-120nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-090nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-060nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-030nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:51, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-150nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:51, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-120nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-090nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-060nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-030nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:48, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:46, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:46, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 10:43, 15 March 2011 Ast talk contribs changed group membership for Bilal from (none) to nanotech
• 14:00, 10 March 2011 Ast talk contribs changed group membership for Pfos from (none) to nanotech
• 15:21, 8 March 2011 Ast talk contribs changed group membership for Alijo from (none) to nanotech
• 09:15, 8 March 2011 Ast talk contribs changed group membership for Hsch from (none) to fotonik
• 13:51, 7 March 2011 Choi talk contribs uploaded File:Imm.jpg (Picture of the IMM.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 10:21, 25 February 2011 Ast talk contribs changed group membership for Wan from (none) to nanotech