All public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

• 10:16, 25 February 2011 Jml talk contribs uploaded File:Crystalbond2.jpg (Problems with crystalbond on Pegasus: A wafer bonded to a carrier has slided off during process.)
• 12:02, 24 February 2011 Ast talk contribs changed group membership for Zhe from (none) to nanotech
• 11:33, 24 February 2011 Ast talk contribs changed group membership for Remn from (none) to nanotech
• 10:05, 24 February 2011 Ast talk contribs changed group membership for Makei from (none) to danchip
• 15:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-30 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
• 15:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-120 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
• 13:17, 23 February 2011 Ast talk contribs changed group membership for Joer from (none) to nanotech
• 10:51, 22 February 2011 Ast talk contribs changed group membership for Ales from (none) to nanotech
• 11:53, 21 February 2011 Ast talk contribs changed group membership for Cdp from (none) to nanotech
• 09:08, 16 February 2011 Ast talk contribs changed group membership for Imso from (none) to fotonik
• 14:10, 11 February 2011 Jehan talk contribs uploaded File:Process flow template.doc (Process flow template/ Procesfølge skabelon)
• 11:31, 10 February 2011 Ast talk contribs changed group membership for Ekm from (none) to nanotech
• 11:25, 10 February 2011 Ast talk contribs changed group membership for Suh from (none) to nanotech
• 10:47, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in32ml cycl.PNG
• 10:42, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in 32ml cycl.PNG (Spinning curve for diluted SU8 2002.)
• 10:54, 9 February 2011 Ast talk contribs changed group membership for Giogi from (none) to fotonik
• 10:32, 9 February 2011 Ast talk contribs changed group membership for Greal from (none) to industry
• 10:24, 9 February 2011 Ast talk contribs changed group membership for Mahuf from (none) to industry
• 11:19, 8 February 2011 Ast talk contribs changed group membership for Zolba from (none) to industry
• 10:23, 8 February 2011 Ast talk contribs changed group membership for Paom from (none) to nanotech
• 10:02, 8 February 2011 Ast talk contribs changed group membership for Afp from (none) to nanotech
• 14:50, 1 February 2011 Ast talk contribs changed group membership for Gllk from (none) to nanotech
• 15:05, 31 January 2011 Ast talk contribs changed group membership for Choi from (none) to danchip
• 10:44, 31 January 2011 Ast talk contribs changed group membership for Ssg from (none) to fotonik
• 10:11, 24 January 2011 Ast talk contribs changed group membership for Clgr from (none) to fotonik
• 09:16, 19 January 2011 Ast talk contribs changed group membership for Lkt from (none) to nanotech
• 10:25, 17 January 2011 Ast talk contribs changed group membership for Zhalu from (none) to nanotech
• 09:58, 17 January 2011 Ast talk contribs changed group membership for Lmb from (none) to nanotech
• 09:48, 17 January 2011 Ast talk contribs changed group membership for Jdt from (none) to nanotech
• 09:46, 17 January 2011 Ast talk contribs changed group membership for Saen from (none) to nanotech
• 09:41, 17 January 2011 Ast talk contribs changed group membership for Cb from (none) to danchip
• 09:34, 17 January 2011 Ast talk contribs changed group membership for Gs from (none) to danchip
• 14:42, 12 January 2011 Meno talk contribs changed group membership for CMP from (none) to nanotech
• 14:24, 6 January 2011 Meno talk contribs changed group membership for KE from (none) to nanotech
• 11:38, 4 January 2011 Ast talk contribs changed group membership for Jvl from (none) to nanotech
• 09:18, 21 December 2010 Ast talk contribs changed group membership for Izzet from (none) to nanotech
• 10:41, 9 December 2010 Ast talk contribs changed group membership for Jehan from industry to danchip
• 09:49, 9 December 2010 Ast talk contribs changed group membership for Lucap from (none) to nanotech
• 09:12, 3 December 2010 BGE talk contribs uploaded File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:12, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:10, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 4.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 3.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)