All public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 2.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 1.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 6.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 16:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 05.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 16:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 04.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 03.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 02.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:58, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 01.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 10:21, 25 November 2010 Ast talk contribs changed group membership for Dok from (none) to nanotech
• 09:17, 18 November 2010 Tg talk contribs deleted page Process flow approval (content was: '== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ...' (and the only contributor was 'Tg'))
• 16:12, 15 November 2010 BGE talk contribs uploaded File:AOE act neg resist profile.jpg
• 16:04, 15 November 2010 BGE talk contribs uploaded File:AOE act neg 2 A.jpg
• 11:23, 3 November 2010 Ast talk contribs changed group membership for Ithy from (none) to nanotech
• 11:21, 3 November 2010 Ast talk contribs changed group membership for Katk from (none) to nanotech
• 11:19, 3 November 2010 Ast talk contribs changed group membership for Sitl from (none) to nanotech
• 11:09, 2 November 2010 Ast talk contribs changed group membership for Lht1 from (none) to industry
• 09:37, 1 November 2010 Ast talk contribs changed group membership for Marco from (none) to fotonik
• 13:12, 27 October 2010 Tg talk contribs uploaded File:F 01.jpg (udefra aften)
• 13:04, 27 October 2010 Tg talk contribs uploaded File:Indefra.jpg (indefra)
• 12:58, 27 October 2010 Tg talk contribs uploaded File:Folder 003.jpg (renrum udefra)
• 12:55, 27 October 2010 Tg talk contribs uploaded File:Folder 004.jpg (e-beam)
• 10:53, 27 October 2010 Ast talk contribs changed group membership for Mij from (none) to nanotech
• 12:20, 26 October 2010 Ast talk contribs changed group membership for Ami from (none) to industry
• 08:44, 26 October 2010 Ast talk contribs changed group membership for Morgi from (none) to danchip
• 08:24, 26 October 2010 Ast talk contribs changed group membership for Rican from (none) to industry
• 14:35, 25 October 2010 Tg talk contribs deleted page III V wet etches (content was: '==HCl:H3PO4 etch== HCl(37%):H<math>_3</math>PO<math>_4</math>(85%) is a selective, anisotropic and slow etching of InP. Very slow rate in quarternaries. The etch rates dep...' (and the only contributor was 'Tg'))
• 12:54, 22 October 2010 Tg talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/CHF3 O2 RIE (content was: '== CHF<math>_3</math> / O<math>_2</math> etch== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</m...' (and the only contributor was 'Tg'))
• 11:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip and administrator to danchip, administrator and bureaucrat
• 11:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip to danchip and administrator
• 13:23, 4 October 2010 Ast talk contribs changed group membership for Anl from (none) to nanotech
• 13:15, 4 October 2010 Ast talk contribs changed group membership for Jka from (none) to nanotech
• 07:57, 4 October 2010 Ast talk contribs changed group membership for Acav from (none) to nanotech
• 13:19, 1 October 2010 Ast talk contribs changed group membership for Mowin from (none) to nanotech
• 12:03, 1 October 2010 Ast talk contribs changed group membership for Mdyma from (none) to danchip
• 10:45, 1 October 2010 Ast talk contribs changed group membership for Tg from (none) to danchip
• 08:17, 28 September 2010 Ast talk contribs changed group membership for Stau from (none) to fotonik
• 10:30, 24 September 2010 Ast talk contribs changed group membership for Anb from (none) to nanotech
• 10:05, 24 September 2010 Ast talk contribs changed group membership for Fica from dtu and fotonik to dtu
• 10:02, 24 September 2010 Ast talk contribs changed group membership for Fica from fotonik to fotonik and dtu
• 09:16, 23 September 2010 Ast talk contribs changed group membership for Fica from (none) to fotonik
• 09:55, 21 September 2010 Ast talk contribs changed group membership for Nadia from (none) to fotonik
• 10:15, 14 September 2010 Ast talk contribs changed group membership for Krb from (none) to nanotech
• 10:12, 14 September 2010 Ast talk contribs changed group membership for Sft from (none) to nanotech
• 09:15, 14 September 2010 Ast talk contribs changed group membership for Lkg from (none) to nanotech
• 08:13, 14 September 2010 Ast talk contribs changed group membership for Jlr from (none) to nanotech
• 08:49, 13 September 2010 Ast talk contribs changed group membership for Kaf from (none) to industry
• 13:23, 10 September 2010 Ast talk contribs changed group membership for Robin from (none) to nanotech
• 13:20, 10 September 2010 Ast talk contribs changed group membership for Yub from (none) to nanotech
• 13:16, 10 September 2010 Ast talk contribs changed group membership for Mamot from (none) to nanotech
• 13:16, 10 September 2010 Ast talk contribs changed group membership for Andr from (none) to nanotech