Specific Process Knowledge/Lithography/Coaters: Difference between revisions

Revision as of 11:23, 30 May 2013

Coaters: Comparison Table

Equipment		SSE Spinner	KS Spinner
Purpose		Spinning and baking of AZ2514E resist Spinning and baking of AZ4562 resist Spinning and baking of e-beam resist	Spinning and baking of AZ2514E resist Spinning and baking of AZ4562 resist Spinning and baking of SU8 resist
Performance	Substrate handling	Cassette-to-cassette Edge handling chuck	Single substrate Non-vacuum chuck for fragile substrates
	Permanent media	AZ5214E resist AZ4562 resist Acetone for chuck cleaning Acetone for drip pan	AZ5214E resist PGMEA for edge bead removal Acetone for chuck cleaning
	Manual dispense option	2 automatic syringes	yes pneumatic dispense for SU8 resist
Process parameter range	Parameter 1	Range	Range
Process parameter range	Parameter 2	Range	Range
Substrates	Batch size	24 50 mm wafers 24 100 mm wafers 24 150 mm wafers	1 100 mm wafers 1 150 mm wafers
	Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3

SSE Spinner

The SSE spinner MAXIMUS: positioned in Cleanroom 13. SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates.

The system is equipped with 2 different resists lines: AZ5214E and AZ4562 and 2 syringe lines, which can be used for spinning of e-beam resist.

The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager

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KS Spinner

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Manual Spinner( Polymers)

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SÜSS Spinner-Stepper

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 [[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]]
-<blockquote>
 The SSE spinner MAXIMUS: positioned in Cleanroom 13.
 SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates.
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 ==KS Spinner==