Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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[[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] | [[Image:SSEspinner2.jpg|200 × 200px|thumb|right|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]] | ||
The SSE spinner MAXIMUS: positioned in Cleanroom 13. | The SSE spinner MAXIMUS: positioned in Cleanroom 13. | ||
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. | SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. | ||
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A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. | A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. A lot of text here. | ||
==KS Spinner== | ==KS Spinner== | ||