Specific Process Knowledge/Lithography/Coaters: Difference between revisions
No edit summary |
|||
| Line 85: | Line 85: | ||
The SSE spinner MAXIMUS: positioned in Cleanroom 13. | The SSE spinner MAXIMUS: positioned in Cleanroom 13. | ||
SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. The system is equipped with 2 different resists lines: AZ5214E and AZ4562 and 2 syringe lines, which can be used for spinning of e-beam resist. | SSE Spinner, Maximus 804, SSE Sister Semiconductor Equipment is a resist spinning system at Danchip which can be used for spinning on 2", 4" and 6" substrates. | ||
The system is equipped with 2 different resists lines: AZ5214E and AZ4562 and 2 syringe lines, which can be used for spinning of e-beam resist. | |||
The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager | The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager: Equipment info in LabManager | ||