Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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==SSE Spinner==
[[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]]
==KS Spinner==
[[Image:KSspinner.JPG|200×200px|right|thumb|The KS spinner is placed in Cleanroom 3.]]
==Manual Spinner( Polymers)==
[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]]
==SÜSS Spinner-Stepper==
[[Image:Gamma_2M.jpg|200×200px|right|thumb|The SÜSS Spinner-Stepper is placed in Stepper room.]]
==Equipment performance and process related parameters==
==Equipment performance and process related parameters==


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==SSE Spinner==
[[Image:SSEspinner2.jpg|200 × 200px|thumb|The SSE spinner MAXIMUS: positioned in Cleanroom 13.]]
==KS Spinner==
[[Image:KSspinner.JPG|200×200px|right|thumb|The KS spinner is placed in Cleanroom 3.]]
==Manual Spinner( Polymers)==
[[Image:Opticoat.jpg|200×200px|right|thumb|The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.]]
==SÜSS Spinner-Stepper==
[[Image:Gamma_2M.jpg|200×200px|right|thumb|The SÜSS Spinner-Stepper is placed in Stepper room.]]

Revision as of 11:08, 30 May 2013

Equipment performance and process related parameters

Equipment SSE Spinner KS Spinner
Purpose
  • Spinning and baking of AZ2514E resist
  • Spinning and baking of AZ4562 resist
  • Spinning and baking of e-beam resist
  • Spinning and baking of AZ2514E resist
  • Spinning and baking of AZ4562 resist
  • Spinning and baking of SU8 resist
Performance Substrate handling
  • Cassette-to-cassette
  • Edge handling chuck
  • Single substrate
  • Non-vacuum chuck for fragile substrates
Permanent media
  • AZ5214E resist
  • AZ4562 resist
  • Acetone for chuck cleaning
  • Acetone for drip pan
  • AZ5214E resist
  • PGMEA for edge bead removal
  • Acetone for chuck cleaning
Manual dispense option
  • 2 automatic syringes
  • yes
  • pneumatic dispense for SU8 resist
Process parameter range Parameter 1
  • Range
  • Range
Parameter 2
  • Range
  • Range
Substrates Batch size
  • 24 50 mm wafers
  • 24 100 mm wafers
  • 24 150 mm wafers
  • 1 100 mm wafers
  • 1 150 mm wafers
Allowed materials
  • Allowed material 1
  • Allowed material 2
  • Allowed material 1
  • Allowed material 2
  • Allowed material 3



SSE Spinner

The SSE spinner MAXIMUS: positioned in Cleanroom 13.



KS Spinner

The KS spinner is placed in Cleanroom 3.



Manual Spinner( Polymers)

The Manual Spinner(Polymers) is placed in fumehood in Cleanroom 3.


SÜSS Spinner-Stepper

The SÜSS Spinner-Stepper is placed in Stepper room.
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