Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420: Difference between revisions

Revision as of 09:41, 13 May 2013 view source Bghe (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,319 edits No edit summary ← Older edit		Revision as of 09:18, 28 May 2013 view source Pevo (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 2,366 edits →KLA-Tencor Surfscan 6420 Newer edit →
Line 5:		Line 5:
	[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]		[[image:Surfscan_at_FAT.JPG\|300x300px\|right\|thumb\|The image is from the cleanroom at the place it was refurbish in California.]]

	Particle counting of an unpatterned surface. A broad range of particles size from 0.1 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films ~~as e.g. Poly-si,~~ Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.		Particle counting of an unpatterned surface. A broad range of particles size from 0.15 µm to greater than 3 µm can be measured on a polished silicon or epitaxial layers. Thin films like Nitride and thermal Oxide can also be inspected. The system will remove small surface roughness so it will not count as particles.