Specific Process Knowledge/Thin film deposition/Electroplating-Ni: Difference between revisions
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== | == Technotrans microform.200 == | ||
The Technotrans microform.200 (Electroplating-Ni in LabManager) is a machine capable of depositing nickel electrochemically. This is done by lowering the sample into an electrolyte containing nickel ions and the apply a voltage across the sample and the anode. The anode is a basket filled with nickel pellets. The cathode is the sample to be coated with nickel. | |||
'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' | '''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' |
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Technotrans microform.200
The Technotrans microform.200 (Electroplating-Ni in LabManager) is a machine capable of depositing nickel electrochemically. This is done by lowering the sample into an electrolyte containing nickel ions and the apply a voltage across the sample and the anode. The anode is a basket filled with nickel pellets. The cathode is the sample to be coated with nickel.
The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:
Process information
Equipment | Equipment 1 | |
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Purpose |
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Performance | Response 1 |
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Response 2 |
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Process parameter range | Parameter 1 |
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Parameter 2 |
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Substrates | Batch size |
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Allowed materials |
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