Specific Process Knowledge/Thin film deposition/Electroplating-Ni: Difference between revisions
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== Process information == | == Process information == | ||
Example: | Example: | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Electroplating of nickel| | *[[Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Electroplating of nickel|Standard processes]] | ||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== |
Revision as of 15:15, 27 May 2013
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Name of equipment
Write a short description of the equipment(s).
The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:
Process information
Example:
Equipment | Equipment 1 | |
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Purpose |
| |
Performance | Response 1 |
|
Response 2 |
| |
Process parameter range | Parameter 1 |
|
Parameter 2 |
| |
Substrates | Batch size |
|
Allowed materials |
|