Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
Created page with "===Chromium etch=== The Chromium etch has ONLY been carried out on the following substrate stack: The Chromium is sputter deposited onto a 2" quartz wafer and pattered by e-be..." |
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===Chromium etch=== | ===Chromium etch in ICP metal=== | ||
The Chromium etch has ONLY been carried out on the following substrate stack: | The Chromium etch has ONLY been carried out on the following substrate stack: | ||
The Chromium is sputter deposited onto a 2" quartz wafer and pattered by e-beam with Zep520A resist. | The Chromium is sputter deposited onto a 2" quartz wafer and pattered by e-beam with Zep520A resist. | ||