Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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*As many small samples as can be fitted on the 100mm carrier. | *As many small samples as can be fitted on the 100mm carrier. | ||
*<nowiki>#</nowiki>1 100mm wafer (or smaller with carrier) | *<nowiki>#</nowiki>1 100mm wafer (or smaller with carrier) | ||
*<nowiki>#</nowiki>1 150mm wafer (only when | *<nowiki>#</nowiki>1 150mm wafer (only RIE2 when set up for 150mm) | ||
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*As many small samples as can be fitted on a 100mm wafer | *As many small samples as can be fitted on a 100mm wafer | ||