Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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*~3-4µm/min in 40%HF | *~3-4µm/min in 40%HF | ||
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*Process | *Process dependent | ||
*Tested range: ~20nm/min - ~120nm/min | *Tested range: ~20nm/min - ~120nm/min | ||
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*Process | *Process dependent | ||
*Tested range: ~230nm/min - ~550nm/min | *Tested range: ~230nm/min - ~550nm/min | ||
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*Process | *Process dependent | ||
*Tested once ~22nm/min | *Tested once ~22nm/min | ||
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