Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
| Line 35: | Line 35: | ||
|Process Temperature | |Process Temperature | ||
| | | | ||
* | *725 <sup>o</sup>C | ||
| | | | ||
*300 <sup>o</sup>C | *300 <sup>o</sup>C | ||
| Line 35: | Line 35: | ||
|Process Temperature | |Process Temperature | ||
| | | | ||
* | *725 <sup>o</sup>C | ||
| | | | ||
*300 <sup>o</sup>C | *300 <sup>o</sup>C | ||