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Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions

BGE (talk | contribs)
BGE (talk | contribs)
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*Isotropic etch
*Isotropic etch
*Well suited for removing all  PECVD nitride on a wafer surface (nitride strip) without a mask. Etches LPCVD nitride very slowly
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*Anisotropic etch: vertical sidewalls
*Anisotropic etch: vertical sidewalls
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*Photoresist
*Photoresist
*PolySilicon
*PolySilicon
*Silicon nitride (LPCVD)
*Blue film
*Blue film
*Cr/Au for deeper etches (plastic beaker)
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*Photoresist
*Photoresist