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Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions

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There are a broad varity of silicon oxide etch methods at Danchip. The methodes are compared here to make it easier for you to compare and choose the one that suits your needs.  
There are a broad varity of silicon oxide etch methods at Danchip. The methodes are compared here to make it easier for you to compare and choose the one that suits your needs.  


 
*[[Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF)|Wet Silicon Oxide Etch]]
*[[Specific Process Knowledge/Etch/Wet Silicon Nitride Etch|Wet Silicon Nitride Etch]]
*[[/SiO2 etch using RIE1 or RIE2|Dry etch using RIE1 or RIE2]]
*[[/Etch of Silicon Nitride using RIE|Etch of Silicon Nitride using RIE]]
*[[/SiO2 etch using AOE|Dry etch using AOE]]
*[[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE|Etch of Silicon Nitride using AOE]]
*[[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE/IBSD Ionfab 300]]
*[[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE/Ion Beam Etching using IBSD Ionfab 300]]


==Compare the methods for Silicon Oxide etching==
==Compare the methods for Silicon Oxide etching==
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