Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
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*Photoresist | *Photoresist | ||
*DUV resist | |||
*E-beam resist | *E-beam resist | ||
*Silicon Oxide | *Silicon Oxide | ||
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*Metals if they cover less than 5% of the wafer area (ONLY RIE2!) | *Metals if they cover less than 5% of the wafer area (ONLY RIE2!) | ||
| | | | ||
*Photoresist | *Photoresist | ||
*DUV resist | |||
*E-beam resist | |||
*Silicon Oxide | *Silicon Oxide | ||
*Silicon Nitride | *Silicon Nitride | ||