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Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions

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BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
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!Substrate size
!Substrate size
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*<nowiki>#</nowiki>25 wafers of 100mm in our 100mm bath
*<nowiki>#</nowiki>1-25 100 mm wafers  
*<nowiki>#</nowiki>1-5 wafers of 100mm or 50mm in "Fumehood KOH"
*<nowiki>#</nowiki>25 wafers of 100mm or 150mm in our 6" bath
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*<nowiki>#</nowiki>25 100 mm wafers in our 100mm bath
*<nowiki>#</nowiki>1-25 100mm wafers in our 100mm bath
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*As many small samples as can be fitted on the 100mm carrier.
*As many small samples as can be fitted on the 100mm carrier.
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*<nowiki>#</nowiki>1 150mm wafer (only when the system is set up for 150mm)  
*<nowiki>#</nowiki>1 150mm wafer (only when the system is set up for 150mm)  
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AOE
*As many small samples as can be fitted on a 100mm wafer
*As many small samples as can be fitted on a 100mm wafer
*<nowiki>#</nowiki>1 50 mm wafer fitted on a 100mm wafer
*<nowiki>#</nowiki>1 50 mm wafer fitted on a 100mm wafer
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