Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions
No edit summary |
|||
| Line 184: | Line 184: | ||
!Generel description | !Generel description | ||
| | | | ||
*Anisotropic etch in | *Anisotropic etch in crystalline silicon | ||
*High selectivity to the | *High selectivity to the {111}-planes | ||
*Anisotropic etch: vertical sidewalls independent of the crystal plans | *Anisotropic etch: vertical sidewalls independent of the crystal plans | ||
| | | | ||