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There are a broad varity of silicon nitride etch methods at Danchip. The methodes are compared here to make it easier for you to compare and choose the one that suits your needs.  
There are a broad varity of silicon nitride etch methods at Danchip. The methodes are compared here to make it easier for you to compare and choose the one that suits your needs.  


===Wet etches:===
*[[Specific Process Knowledge/Etch/KOH Etch|KOH Etch]]
*[[Specific Process Knowledge/Etch/Wet Polysilicon Etch|Wet PolySilicon etch]]


===Dry etches:===
*[[Specific Process Knowledge/Etch/Wet Silicon Nitride Etch|Wet Silicon Nitride Etch]]
*[[/Si etch using RIE1 or RIE2|Si etch using RIE1 or RIE2]]
*[[/Etch of Silicon Nitride using RIE|Etch of Silicon Nitride using RIE]]
*[[/Si etch using ASE|Si etch using ASE (Advanced Silicon Etch)]]
*[[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)|Etch of Silicon Nitride using AOE]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus|Si etch using DRIE-Pegasus (Silicon Etch)]]
*[[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE/Ion Beam Etching using IBSD Ionfab 300]]
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Si etch|Si etch using IBE/IBSD Ionfab 300]]


==Compare the methodes for Si etching==
==Compare the methodes for Si etching==
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