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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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!Substrate size
!Substrate size
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*samples smaller than 100 mm wafers must be glued to a 100 mm wafer or placed in a reces on a 100 mm wafer.
*Samples smaller than 100 mm wafers must be glued to a 100 mm wafer or placed in a reces on a 100 mm wafer.
*<nowiki>#</nowiki>1 100 mm wafer
*<nowiki>#</nowiki>1 100 mm wafer
*<nowiki>#</nowiki>1 150 mm wafer (only when system is set up to 150mm wafers)  
*<nowiki>#</nowiki>1 150 mm wafer (only when system is set up for 150 mm wafers)  
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*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> small samples
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Silicon wafers with layers of  
Silicon wafers with layers of  
*silicon oxide or silicon (oxy)nitride
*Silicon oxide or silicon (oxy)nitride
*Photoresist/e-beam resist
*Photoresist/e-beam resist
*PolySilicon
*PolySilicon
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