Jump to content

Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

BGE (talk | contribs)
Jml (talk | contribs)
Line 43: Line 43:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Generel description
!General description
|The ASE was originally for deep Si etch but has now been turned into a polymer etcher. It should be used for pattering polymers
|The ASE was originally a dedicated deep Si etcher, but with the arrival of the Pegasus it has now been opened for polymer etching.  
|The plasma asher is good for dry stripping polymers. It can also be used for descum and pattering af polymers.   
|The plasma asher is good for dry stripping polymers. It can also be used for descum and pattering af polymers.   
|The plasma asher is good for dry stripping polymers. It can also be used for descum and pattering af polymers. This plasma asher is for Si wafers without metals.
|The plasma asher is good for dry stripping polymers. It can also be used for descum and pattering af polymers. This plasma asher is for Si wafers without metals.