Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions
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== | == Etchning of Polymers == | ||
Stripping of polymers are often done by wet chemistry in a solvent that dissolves the given polymer. If wet chemistry cannot be used or a more controled etch of the polymer is needed a plasma system is used instead. Plasma ashers are design for removing polymers in primarily oxygen plasmas. It you need a more directional etch with a masking material RIE2 or ASE can be used. | |||
*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | *[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | ||
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*[[/Deposition of silicon nitride using LPCVD|Process description using method 2]] | *[[/Deposition of silicon nitride using LPCVD|Process description using method 2]] | ||
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*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | |||
*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | |||
*[[/Deposition of silicon nitride using LPCVD|Process description using method 1]] | |||
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