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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|Method 1]]
![[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride|ASE]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Method 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Plasma asher 1]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Plasma asher 2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|RIE2]]
![[Specific Process Knowledge/Thin film deposition/PECVD|By wet etch]]
 
 
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|Generel description - method 1
|Generel description - method 1
|Generel description - method 2
|Generel description - method 2
|Generel description - method 3
|Generel description - method 4
|Generel description - method 5
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