Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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!style="background:silver; color:black"|Purpose | !style="background:silver; color:black;"|Purpose | ||
|style="background:LightGrey; color:black"|Deposition of silicon nitride ||style="background:WhiteSmoke; color:black"|Stoichiometry: | |style="background:LightGrey; color:black"|Deposition of silicon nitride ||style="background:WhiteSmoke; color:black"|Stoichiometry: | ||
*Si<sub>3</sub>N<sub>4</sub> | *Si<sub>3</sub>N<sub>4</sub> | ||