Specific Process Knowledge/Etch/Etching of Gold: Difference between revisions
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*~60nm/min (Al+1.5% Si) | *~60nm/min (Al+1.5% Si) | ||
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*~30nm/min (not tested yet) | *~30nm/min (not tested yet) | ||
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| Line 102: | Line 102: | ||
*~60nm/min (Al+1.5% Si) | *~60nm/min (Al+1.5% Si) | ||
| | | | ||
*~30nm/min (not tested yet) | *~30nm/min (not tested yet) | ||
|- | |- | ||