Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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	==Etch rate of the Stoichiometric Silicon Nitride in BHF==		==Etch rate of the Stoichiometric Silicon Nitride in BHF==
	The etch rate of Si3N4 in BHF has been measured to be 0,75 nm/min (by Morten Bo Mikkelsen, March 2013.		The etch rate of Si3N4 in BHF has been measured to be 0,75 nm/min (by Morten Bo Mikkelsen, March 2013).