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| Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. | | Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions. |
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| ==Wet etching of Titanium==
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| [[Image:Fumehoodetch-chrom2.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Titanium can take place in this pp tank or in a beaker in this fume hood]]
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| We have two solutions for wet titanium etching:
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| # BHF
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| # Cold RCA1
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| Do it by making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. BHF etching can also take place in the PP-etch bath in the fume hood in cleanroom 2.
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| ===Comparing the two solutions===
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| {| border="1" cellspacing="0" cellpadding="4"
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| !
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| ! width="200" | BHF
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| ! width="200" | Cold RCA1
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| |-
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| |'''General description'''
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| | Etch of titanium with or without photoresist mask.
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| | Etch of titanium (as stripper or with eagle resist).
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| |-
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| |'''Chemical solution'''
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| |HF:NH<sub>4</sub>F
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| |NH<sub>3</sub>OH:H<sub>2</sub>O<sub>2</sub>:H<sub>2</sub>O - 1:1:5
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| |-
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| |'''Process temperature'''
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| |Room temperature
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| |Room temperature
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| |-
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| |'''Possible masking materials'''
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| Photoresist (1.5 µm AZ5214E)
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| Eagle resist
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| |-
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| |'''Etch rate'''
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| Not known (it bubbles while etching)
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| Not known
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| |'''Batch size'''
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| 1-5 4" in beaker
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| 1-25 wafers at a time in PP-etch bath
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| 1-5 4" wafer at a time
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| |'''Etch bath'''
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| |Beaker or PP-etch bath in the fume hood in cleanroom 2.
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| |Beaker
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| |'''Allowed materials'''
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| No restrictions when used in beaker or PP-etch bath in the fume hood in cleanroom 2.
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| Make a note on the beaker of which materials have been processed.
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| No restrictions when used in beaker.
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| Make a note on the beaker of which materials have been processed.
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| |-
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| |}
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| == Dry etching of titanium == | | == Dry etching of titanium == |
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| See the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] page. | | See the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] page. |
